Nanoporous block copolymer films using highly selective solvents and non-solvent extraction.
نویسندگان
چکیده
Nanoporous block copolymer thin films are fabricated by selective solvent swelling of the majority phase and subsequent rapid extraction with a miscible non-solvent (water). Selection of the initial solvent provides a facile route to tune the porosity of the films. Poly(butylnorbornene)-block-poly(hydroxyhexafluoroisopropyl norbornene) (BuHFA) is used to generate these porous thin films due to its high Tg (>300 °C) and the selectivity of primary alcohols towards poly(hydroxyhexafluoroisopropyl norbornene) (pHFANB) to enable a relatively environmentally benign process. As the solvent quality for the HFA increases from ethanol to isopropanol to n-butanol, the porosity of the film developed by water extraction increases up to 69%. Aqueous mixtures of ethanol provide an addition handle to tune the porosity between 10 and 54%. These nanoporous films are robust with the porosity nearly unchanged after extended heating at 160 °C. Their elastic moduli are investigated using surface wrinkling and the modulus, E, scales with the film density, ρ, as E ∼ ρ(2.2), which is similar to cellular solids. The nanopores are templated by the self-assembled structure of the block copolymer, so these coatings are transparent despite the high porosity. These thin films act as anti-reflective coatings for glass slides. Spin coating provides a coating on both sides and processing to generate 55% porosity leads to an increase in transmittance from approximately 92% to 99.1% (average for the full range of visible light). A maximum transmittance of 99.8% is found at 523 nm. This methodology is simple and highly tunable; extension to other block copolymer systems is likely possible if sufficient solubility contrast between segments exists.
منابع مشابه
Reversible switch between the nanoporous and the nonporous state of amphiphilic block copolymer films regulated by selective swelling.
Switchable nanoporous films, which can repeatedly alternate their porosities, are of great interest in a diversity of fields. Currently these intelligent materials are mostly based on polyelectrolytes and their porosities can change only in relatively narrow ranges, typically under wet conditions, severely limiting their applications. Here we develop a new system, which is capable of reversibly...
متن کاملDefect-free nanoporous thin films from ABC triblock copolymers.
The self-assembly of triblock copolymers of poly(ethylene oxide-b-methyl methacrylate-b-styrene) (PEO-b-PMMA-b-PS), where PS is the major component and PMMA and PEO are minor components, provides a robust route to highly ordered, nanoporous arrays with cylindrical pores of 10-15 nm that show promise in block copolymer lithography. These ABC triblock copolymers were synthesized by controlled liv...
متن کاملNanostructures fabrication via self-assembly of hybrid block copolymer/nanoparticles in thin film
Hierarchical nanostructure of gold nanoparticles via self-assembled block copolymer have been investigated on native oxide-terminated Si(111). Au-nanoparticles were prepared via simple wet chemical method by using Poly styrene-block-4-vinylpyridin (PS-b-P4VP) as stabiliser in nonaqueous solvents. Transmission Electron Microscopy (TEM) is used to characterise the size of the Aunanoparticles. How...
متن کاملAbstract Submitted for the MAR13 Meeting of The American Physical Society In-situ Grazing-incidence Small-angle X-ray Scattering Study of Diblock Copolymer Thin Films during Solvent Annealing
Submitted for the MAR13 Meeting of The American Physical Society In-situ Grazing-incidence Small-angle X-ray Scattering Study of Diblock Copolymer Thin Films during Solvent Annealing XIAODAN GU, University of Massachusetts Amherst, ILJA GUNKEL, ALEXENDER HEXEMER, Lawrence Berkeley National lab, THOMAS RUSSELL, University of Massachusetts Amherst, UNIVERSITY OFMASSACHUSETTS AMHERST COLLABORATION...
متن کاملFabrication of Highly Ordered Polymeric Nanodot and Nanowire Arrays Templated by Supramolecular Assembly Block Copolymer Nanoporous Thin Films
Realizing the vast technological potential of patternable block copolymers requires both the precise controlling of the orientation and long-range ordering, which is still a challenging topic so far. Recently, we have demonstrated that ordered nanoporous thin film can be fabricated from a simple supramolecular assembly approach. Here we will extend this approach and provide a general route to f...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
عنوان ژورنال:
- Soft matter
دوره 11 43 شماره
صفحات -
تاریخ انتشار 2015